Dense optical thin film with no wavelength shift can be deposited.
The low-temperature deposition supports various applications.
Only through time control can complex optical film set with stringent specifications be deposited as specified in its film design.
Reproducible thin film with an intermediate refraction index is obtained by the mixing of material with a high refraction index and that with a low refraction index.
Functional thin film including nitride film and decorative thin film is available.
The load lock system continues to supply the stable quality of deposited film.
The equipment has an environmentally-aware design with increased deposition efficiency and is downsized for CO2 reduction.
The work burden of maintenance and cleaning is reduced dramatically from conventional vapor deposition systems.
With an area of deposited film of about 0.7m2, the coefficient of variation of the coating thickness is kept under 0.5%.
The automatic sputtering control system automates the process of sputtering.
The base drum can be detached with an easily-handled lifter.
* The product specifications may be modified for improved performance without any notice.
For details, please contact our sales division.