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Ion Source

Computer System for Film Deposition

Formation

Production on Orders

Obsolete Models

Information about used equipment
RF (Radio Frequency) Excitation Ion Source, Embedded Type
Features
A large current of up to 1.2A is available.
The structure of non-electrode discharge eliminates the risk of contamination.
Long continuous operation made possible by filamentless structure.
Auto-matching system for RF enables stable discharge.
Drastically reduces maintenance time.

RF Excitation Ion Source
Features
High frequency system enables stable discharge.
Longer maintenance intervals.
Operable for a long period even in an environment where reactive gas is used.
Uniform current density in broad area.
Suitable for an environment using IAD.

Hot-cathode Electron Impact (Kaufman) Ion Source
Features
Uniform ion current density.
Uniform ion energy.
Long-lived cathodes.
Available in highly vacuum environment.
Very small risk of contamination by a neutralizer.
Long-lived neutralizer.

Specification
　 NIS-175 RIS-120D KIS-80D
Ionization Method RF Excitation RF Electron Excitation (High Frequency Excitation) Hot-cathode Electron Impact (Kaufman)
Ionization Method 175mm 120mm 80mm
Shape of Electrodes Dome Dome Dome
Ion Energy 100-1000eV 100-1000eV 100-750eV
Total Current of Ion 1200mA 300mA 200mA
Outer Diameter Φ310 × H210 Φ200 × H732 Φ185 × H300
Neutralizer Current Max. 2000mA Max. 1000mA Max. 300mA


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