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OPM

Ion Source

Computer System for Film Deposition

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Information about used equipment
OPM Series

OPM-Z1
Features
Range of measured wavelength: 350-1100mn
A fiber optics system with little chroma dispersion
Digital signal processing system of light intensity signals
Accuracy of measured wavelength: 0.1nm

OPM-V1
Features
Useful for thickness measurement and thickness control of film being deposited. Wavelengths between ultraviolet and near-infrared, ranging from 380nm to 1100nm.
Adopting a way that uses grating, the equipment is able to extract any wavelength in 1nm segments.
Adopting a high resolution A/D converter and 16-bit computer, the equipment achieves high performance with a command accuracy of ±0.01%.
Remote-controllable via GP-IB or RS-232C.

OPM-8
Features
Useful for thickness measurement and thickness control of film being deposited that are within a range of 430-750nm.
The optical film thickness meter has improved external interfaces and auto-measurement functions.
With a high-performance embedded microprocessor, the equipment achieves high performance with a command accuracy of ±0.01% and an accurate measurement at 0.08 second intervals.
Fully remote-controllable via GP-IB or external signals.

OPM-W1
Features
Supports a broad range of wavelengths ranging from 860 to 1700nm. It has such a high resolution and sensitivity that it is suitable for the thickness control of various optical communication filters including DWDM.
Embedded transparent system enables it to provide self-controlled compensation.
Noise is extremely reduced with an ultra-high intensity light source.
Remote control is available with GP-IB interface.

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* The product specifications may be modified for improved performance without any notice.
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