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Vacuum Thin Film Deposition Equipment for Optical Communications
The SMC Series, Thin Film Deposition Equipment for DWDM, is developed to enable the production of optical filters for which the demand is increasing as a key device for DWDM optical communication.
In particular, the series is highly acclaimed as the vacuum thin film deposition equipment for producing NBPF and WBPF.
Features
With our proprietary IAD (Ion Assisted Deposition), optical filters with little absorption and dispersion can be produced.
The equipment is one of the world's highest level sputters incorporating a dedicated thickness meter and ion guns, thus improving the productivity of NBPF for 50GHz or 100GHz, edge filters and GFF.
A very high-speed board rotation system enables the high-speed and stable rotation of 1000 times per minute.
The equipment achieves a stable deposition rate with two pairs of crystalline thickness sensors.
Two dedicated ion source and two hearths are embedded to offer stable film formation.
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SMC-1100

System Configuration
Base Dome Dedicated Base Holder
Optical Film Thickness Meter OPM-W1
Crystalline Film Thickness Meter (Option) 2 meters
Computer System SDC-W1
Vapor Source Dedicated electron guns
Hearth Dedicated hearths
Ion Source NIS-1, Ion-beam assist, Ion-beam cleaning

Performance of Equipment
Evacuation Period Achieves 3×10-3Pa within 20 min. (Baseboard temperature set to 200ºC)
Achievable Vacuum Pressure 7×10-5Pa or less
Heating Temperature of Baseboard 200ºC in normal use
Film Thickness Distribution, Deposition Test For consultation

Installation Requirements
Power Requirements Three-phase 200V±10% Approx. 77kW (Maximum Power)
Required Coolant Approx. 110L/min. 18-25ºC (Standard: 20ºC)
Required Compressed Air 0.5MPaG or more (up to 0.7MPaG)
Installation Area W×D×H: 4500mm × 7300mm × 4000mm (requires 4300mm-high ceiling)
Gross Weight Approx. 5500kg

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* The product specifications may be modified for improved performance without any notice.
For details, please contact our sales division.
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