SHINCRON Co.,Ltd. JAPANESE VERSION
HOMEContact UsImportant Notices for Customers Using our Products
Thin Film Deposition InformationProduct InformationTechnical InformationQuality AssuranceCompany Information
Shincron's Technology

Vacuum thin film deposition and equipment

Vacuum seminar
For creation of next generation standardsÉWe are challenging new ideas of optical thin film solution.
TiO2 thin film deposition is realized using the RAS series.
Higher inflection ratio is required to design multi-layer optical thin film and many engineers looked forward to this for TiO2 thin film deposition. SHINCRON realized the TiO2 thin film deposition with the RAS series developed with our unique technology. The RAS series continues challenging issues that our customers require.
Feature1  Higher inflection ratio can be obtained with less optical loss.

The wavelength distribution of the optical constant for the RAS TiO2 thin film
The wavelength distribution of the optical constant for the RAS TiO2 thin film
SEM image of RAS TiO2 thin film cross section
SEM image of RAS TiO2 thin film cross section
Feature2  Higher reproduction between batches

Consecutive 3 batch reproduction with optical characteristics of UV-IR cut filter created by double layer RAS TiO2/SiO2
Consecutive 3 batch reproduction with optical characteristics of UV-IR cut filter created by double layer RAS TiO2/SiO2
Feature3  Stable performance where wavelength shift is less likely to occur.

Tolerant environment stability of 29 layers of RAS TiO2/SiO2 filter (boiling pure water for one hour)
Environmental stability and resistance of 29 layers of RAS TiO2/SiO2 filter (boiling pure water for one hour)
(C) Copyright SHINCRON Co.,Ltd. All Rights Reserved. Personal informationImmunitySite map