Load Loack Type Sputter Thin Film Deposition Equipment RAS-1100C
With the proprietary Radical Assisted Sputtering (RAS) method, the RAS-1100C equipment deposits high quality and highly-reproducible optical thin film with no wavelength shift at low temperatures. This is a small-sized entry model that provides functional thin film including decorative thin film and nitride film.
Freatures
- Dense optical thin film with no wavelength shift can be deposited.
- The low-temperature deposition supports various applications.
- Only through time control can complex optical film set with stringent specifications be deposited as specified in its film design.
- Reproducible thin film with an intermediate refraction index is obtained by the mixing of material with a high refraction index and that with a low refraction index.
- Functional thin film including nitride film and decorative thin film is available.
- The load lock system continues to supply the stable quality of deposited film.
- The equipment has an environmentally-aware design with increased deposition efficiency and is downsized for CO2 reduction.
- The work burden of maintenance and cleaning is reduced dramatically from conventional vapor deposition systems.
- With an area of deposited film of about 0.7m2, the coefficient of variation of the coating thickness is kept under 0.5%.
- The automatic sputtering control system automates the process of sputtering.
- The base drum can be detached with an easily-handled lifter.
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System Configuration
| Installed Baseboard | Vertically-placed rotary drum |
|---|---|
| Optical Film Thickness Meter | Optional |
| Crystalline Film Thickness Meter | None |
| Computer System | SSC-1 |
| RAS Structure | Sputter Source + Oxidation Reaction Source |
| Additional Targets | Optional (for chamber 1, single plate only) |
| High-vacuum Evacuation System | Optional (for chamber 1 only) |
Performance of Equipment
| Evacuation Period (Film deposition room) | Achieves 1×10-3Pa within 20 min. (under our measurement conditions) |
|---|---|
| Evacuation Period (Preprocess room) | From atmospheric pressure to 7Pa within 5 min. (under our measurement conditions) |
| Achievable Vacuum Pressure | 1×10-4Pa or less |
| Heating Temperature of Baseboard | No heating |
| Thickness Distribution | CV (Coefficient of Variance) = within 0.5% (under our delivery conditions) |
Installation Requirements
| Power Requirement | Three-phase 200V±10% 65kW (Maximum Power) |
|---|---|
| Requirement of Coolant | Approx. 100L/min. 18-24ºC (Standard: 20ºC) |
| Required Compressed Air | 0.5MPa or more (up to 0.7MPa) |
| Installation Area | W×D×H: 3400mm × 6200mm × 2500mm (requires 2700mm-high ceiling) |
| Gross Weight | Approx. 5700kg |
* The product specifications may be modified for improved performance without any notice.
For details, please contact our sales division.
