Shincron Brand

Shincron’s high level of technological expertise has contributed to the evolution of both evaporation and sputtering technologies. We will seek to develop optimum products and services to meet customer needs, and explore a new future for thin film formation.
Shincron will continue to explore the possibilities for the vacuum thin films coating technologies.

IAD

Ion-beam Assisted Deposition (IAD)
Vacuum deposition is a method to form thin films using evaporation phenomenon. Its low energy of deposited molecule of approximately 0.1 – 0.4 eV caused the issue regarding sticking force and film quality.
By irradiating the plasma activated ions, the IAD method delivers appropriate energy onto the growing surface of vacuum deposited thin films, formed on substrates. This method enables to have improved sticking force and better film quality, which results in high performance dielectric thin films formation such as superior weather resistance function and high film density.
Shincron had developed and sold the world’s first IAD system for mass production, and until today, it has been utilized for a long time of period by many customers.

RAS

Radical Assisted Sputtering
Due to the following reasons, conventional sputtering method had been considered unsuitable for dielectric thin film mass production.
(1) Damage to targets and substrates due to abnormal electrical discharges
(2) Process instability due to anode disappearance
(3) Low deposition rate
The Radical Assisted Sputtering (RAS) method has resolved these issues via spatially separation of the metal sputtering process area and reaction process area. This innovation brought revolutionary advances in the field of dielectric thin films formation using reactive sputtering. Thanks to RAS, the sputtering based dielectric thin films mass production has been realized, and it is now utilized for the fabrication of smartphone and relevant IoT devices, and those devices support our daily life.

Shincron’s three core strengths

The vacuum thin film technology and its field continues to expand, and novel and new market demand emerges every day.
Shincron commits all stakeholders that we will continue to be the company which can deliver the best solution using our advanced technologies and abundant experience we have acquired, via long time business experiences, more than 70 years, in the vacuum thin film field.

01SATISFACTION

Meeting customer demands with our technological capabilities
We meet various customer demands related to systems, such as the customization of systems and joint development of the film deposition process using the technological capabilities we have cultivated.

02CHALLENGE

As a pioneer who doesn’t forget taking up the challenge of new technologies
We have a system to catch up with the changing times and meet new customer needs quickly. We will challenge new technologies and venture into uncharted territory in a proactive manner to continue to be a top runner.

03SUPPORT

Extensive support that gets the full performance out of systems
We provide multifaceted support and advice so that customers can get the maximum performance out of systems. In addition, for customers who use our systems for the first time, we offer various seminars.
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