Next-Generation Sputtering System for High-Precision Crystalline Thin Films

SCP-SX is a sputtering system designed for the deposition of high-quality crystalline thin films at low temperatures. Equipped with a proprietary cathode that allows precise control over both position and tilt angle, the system enables the optimization of deposition conditions for a wide variety of materials and substrates. It provides substantial advantages for both materials research and process development. In addition to supporting fine-tuned process control and material-specific optimization in research settings, the system is also compatible with cluster platforms, facilitating seamless transition from R&D to high-volume manufacturing.

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