Sputtering system for transparent and metallic electrodes

Used for deposition of various types of electrode films

Application:
Electron and electricity control

Features

  1. Enables the deposition of low-resistance electrode films
  2. Enables the deposition of multi-layers of dielectrics and metals

Specification outline

Model BSC-700 BSC-1000 BSC-1900
Drum size ⌀ 630 mm×H 330 mm ⌀ 900 mm×H 760 mm ⌀ 1,700 mm×H 1,420 mm
Sputtering source 5” x 27” x 1 5” x 42” x 2 5” x 65” x 4
Exhaust system Roughing unit / cryopump / turbo-molecular pump
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+81-45-650-2411
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* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.