System for dielectric super multilayer films

A dedicated system for forming low-scattering super multi-layer films

Application:
Optics

In multi-layer films of TiO2/SiO2 with 282 layers and a thickness of 33 μm, this system decreases roughness and “achieves low haze”.

Features

  1. Realizes low-clattering (low-haze) super multi-layer films
  2. Enhances maintainability with multiple doors

Specification outline

Model EPD-1350 EPD-1600
Substrate holder ⌀ 1,200 mm ⌀ 1,450 mm
Film thickness gauge Optical film thickness gauge and quartz type film thickness gauge (Six-point rotary sensor)
Evaporation source EB x 2
Assistance RF ion source
Exhaust system Roughing unit, turbo-molecular pump, and Meissner trap
Contact
We propose systems that meet
your requirements for functions
and applications.
Please feel free to contact us.
Sales Department
+81-45-650-2411
Operating hours: 9:00 – 17:00
[excluding Saturdays, Sundays, and holidays]
* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.