System for dielectric super multilayer films
A dedicated system for forming low-scattering super multi-layer films
- Application:
- Optics
In multi-layer films of TiO2/SiO2 with 282 layers and a thickness of 33 μm, this system decreases roughness and “achieves low haze”.
Features
- Realizes low-clattering (low-haze) super multi-layer films
- Enhances maintainability with multiple doors
Specification outline
| Model | EPD-1350 | EPD-1600 |
|---|---|---|
| Substrate holder | ⌀ 1,200 mm | ⌀ 1,450 mm |
| Film thickness gauge | Optical film thickness gauge and quartz type film thickness gauge (Six-point rotary sensor) | |
| Evaporation source | EB x 2 | |
| Assistance | RF ion source | |
| Exhaust system | Roughing unit, turbo-molecular pump, and Meissner trap | |
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your requirements for functions
and applications.
Please feel free to contact us.
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* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.