Load lock type deposition system for metallic films
A highly functional system that is widely used as a film deposition system for electrodes
- Application:
- Electron and electricity control
This system is widely used as a film deposition system for electrodes employed in electronic devices.
In particular, the electrodes are expected to contribute to the widespread use of 5G as electrodes for IDTs (Interdigital Transducers) employed in SAW filters.
Features
- Enables the deposition of Al and AlCu films with high orientation
- Enables the deposition of metallic films with a refractive index similar to that of bulk
- Enables the deposition of hillockless thin films with low surface roughness
- A design with an optimum substrate incidence angle for lift-off film deposition
Automatic wafer transfer robot for PMC
A robot that enables automatic wafer loading/unloading can be employed as an option.
This robot allows the setting of four cassettes and load/unload wafers onto/from the tray ejected after completion of film deposition, achieving streamlining such as labor saving, dust reduction, and a reduction in wafer breakage rate.
Specification outline
| Model | PMC-800-2S | PMC-800-2M | PMC-800-2MS |
|---|---|---|---|
| Substrate dome | ⌀ 650 mm | ||
| Film thickness gauge | Quartz type film thickness gauge | ||
| Evaporation source | EB x 1 | ||
| Assistance | – | ||
| Exhaust system | Dry pump / cryopump / turbo-molecular pump | ||
| Option | Bombardment / SEMI /GEM-compliant interface | ||
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* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.