Sputtering system for large substrates

The latest model that achieves the highest productivity among RAS series systems

Application:
Surface controlColor control

This system was developed for the purpose of achieving the highest productivity in the history of RAS series systems.
As an increase in drum size and a reduction in system size were realized simultaneously, this system is excellent in area productivity.
RAS-2200 takes full advantage of our RAS technology cultivated up to now to provide the world of optical thin films with new benefits.

Features

  1. Employing a large-sized drum enabled the increase of substrate loading quantity as well as the deposition of films on large substrates
  2. The load lock-type substrate holder transfer method that we developed independently enables the maximum elimination of redundant takt time
  3. Adding the resistance heating deposition source achieved the integrated deposition of antireflection and antifouling films
  4. Films can be deposited on curved substrates
  5. The compact system design enhanced the maintainability

Major applications

  • Antireflection films, rigid films, decorative films, various types of optical filters, and so on
  • Cover glasses for displays employed in in-car devices and smartphones
  • Cover glasses for cameras employed in smartphones

Specification outline

Substrate drum size ⌀ 1,800 x 1,500 mm
Radical source ICP RF radical source x 3
Sputtering source Dual cathode 68” rotary cathode
Exhaust system [CH-1] Roughing unit
[CH-2] 14-inch TMP x 6, Meissner trap, and roughing unit
Option AFS mechanism: CH-2, and substrate heating mechanism: CH-1
Contact
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+81-45-650-2411
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[excluding Saturdays, Sundays, and holidays]
* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.