Batch type deposition system for metals
Enables the reduction of contact resistance through pretreatment with an ion source
- Application:
- Electron and electricity control
This is a batch type deposition system that forms metallic thin films for various types of connecting terminals and electrodes.
It enables stable mass production of metallic thin films.
Major applications
- SAW filters / LEDs / PAs / timing devices and so on
Specification outline
| Model | SIC-900 | SIC-1350 | SIC-1650 |
|---|---|---|---|
| Substrate dome | ⌀ 800 mm | ⌀ 1,200 mm | ⌀ 1,500 mm |
| Film thickness gauge | Quartz type film thickness gauge (Rotary sensor) | ||
| Evaporation source | EB x 1 | ||
| Substrate cleaning | RF ion source | ||
| Exhaust system | Dry pump / cryopump | ||
| Option | SEMI/GEM-compatible interface | ||
Contact
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your requirements for functions
and applications.
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* Product specifications are subject to change for performance improvement without prior notice. For details, please contact our sales representatives.